Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects
Samo za registrovane korisnike
2024
Autori
Popović, M.Novaković, M.
Pjević, Dejan J.
Vaňa, Dušan
Jugović, Dragana
Tošić, D.
Noga, Pavol
Članak u časopisu (Objavljena verzija)
Metapodaci
Prikaz svih podataka o dokumentuApstrakt
In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to th...e surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.
Ključne reči:
crystal defects / ion implantation / microstructure / optical properties / surface oxidation / TiN thin filmsIzvor:
Journal of Alloys and Compounds, 2024, 976, 173046-Izdavač:
- Elsevier
Finansiranje / projekti:
- Ministarstvo nauke, tehnološkog razvoja i inovacija Republike Srbije, institucionalno finansiranje - 200017 (Univerzitet u Beogradu, Institut za nuklearne nauke Vinča, Beograd-Vinča) (RS-MESTD-inst-2020-200017)
- Slovak Research and Development Agency (Project. No. APVV-18–0168)
- European Structural Development Funds (Project No. ITMS2014+ 313011W085)
Institucija/grupa
Институт техничких наука САНУ / Institute of Technical Sciences of SASATY - JOUR AU - Popović, M. AU - Novaković, M. AU - Pjević, Dejan J. AU - Vaňa, Dušan AU - Jugović, Dragana AU - Tošić, D. AU - Noga, Pavol PY - 2024 UR - https://dais.sanu.ac.rs/123456789/16162 AB - In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states. PB - Elsevier T2 - Journal of Alloys and Compounds T1 - Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects SP - 173046 VL - 976 DO - 10.1016/j.jallcom.2023.173046 UR - https://hdl.handle.net/21.15107/rcub_dais_16162 ER -
@article{ author = "Popović, M. and Novaković, M. and Pjević, Dejan J. and Vaňa, Dušan and Jugović, Dragana and Tošić, D. and Noga, Pavol", year = "2024", abstract = "In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.", publisher = "Elsevier", journal = "Journal of Alloys and Compounds", title = "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects", pages = "173046", volume = "976", doi = "10.1016/j.jallcom.2023.173046", url = "https://hdl.handle.net/21.15107/rcub_dais_16162" }
Popović, M., Novaković, M., Pjević, D. J., Vaňa, D., Jugović, D., Tošić, D.,& Noga, P.. (2024). Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds Elsevier., 976, 173046. https://doi.org/10.1016/j.jallcom.2023.173046 https://hdl.handle.net/21.15107/rcub_dais_16162
Popović M, Novaković M, Pjević DJ, Vaňa D, Jugović D, Tošić D, Noga P. Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds. 2024;976:173046. doi:10.1016/j.jallcom.2023.173046 https://hdl.handle.net/21.15107/rcub_dais_16162 .
Popović, M., Novaković, M., Pjević, Dejan J., Vaňa, Dušan, Jugović, Dragana, Tošić, D., Noga, Pavol, "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects" in Journal of Alloys and Compounds, 976 (2024):173046, https://doi.org/10.1016/j.jallcom.2023.173046 ., https://hdl.handle.net/21.15107/rcub_dais_16162 .