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Electronic structure and X-ray spectroscopic properties of the HfFe2Si2 compound

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2019
2301-7.pdf (1.316Mb)
Authors
Shcherba, I. D.
Antonov, V. N.
Zhak, O. V.
Bekenov, L. V.
Kovalska, M. V.
Noga, H.
Uskoković, Dragan
Yatcyk, B. M.
Article (Published version)
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Abstract
The valence band electronic structure of HfFe2Si2 has been established for the first time based on X-ray emission spectroscopy measurements. The band structure and X-ray emission spectra have been also obtained theoretically using the ab initio LMTO method in the non-relativistic approximation. The electron configuration of Si in the compound HfFe2Si2 can be described as $s^{1.1}p^{1.5}$. The theoretical and experimental results are in satisfactory agreement.
Source:
Journal of Physical Studies, 2019, 23, 2
Publisher:
  • West Ukrainian Physical Society

DOI: 10.30970/jps.23.2301

ISBN: 10274642, 23100052

ISSN: 1027-4642; 2310-0052

WoS: 000470090800002

Scopus: 2-s2.0-85070737317
[ Google Scholar ]
Handle
https://hdl.handle.net/21.15107/rcub_dais_6952
URI
http://physics.lnu.edu.ua/jps/2019/2/abs/a2301-7.html
https://dais.sanu.ac.rs/123456789/6952
Collections
  • ИТН САНУ - Општа колекција / ITS SASA - General collection
Institution/Community
Институт техничких наука САНУ / Institute of Technical Sciences of SASA
TY  - JOUR
AU  - Shcherba, I. D.
AU  - Antonov, V. N.
AU  - Zhak, O. V.
AU  - Bekenov, L. V.
AU  - Kovalska, M. V.
AU  - Noga, H.
AU  - Uskoković, Dragan
AU  - Yatcyk, B. M.
PY  - 2019
UR  - http://physics.lnu.edu.ua/jps/2019/2/abs/a2301-7.html
UR  - https://dais.sanu.ac.rs/123456789/6952
AB  - The valence band electronic structure of HfFe2Si2 has been established for the first time based on X-ray emission spectroscopy measurements. The band structure and X-ray emission spectra have been also obtained theoretically using the ab initio LMTO method in the non-relativistic approximation. The electron configuration of Si in the compound HfFe2Si2 can be described as $s^{1.1}p^{1.5}$. The theoretical and experimental results are in satisfactory agreement.
PB  - West Ukrainian Physical Society
T2  - Journal of Physical Studies
T1  - Electronic structure and X-ray spectroscopic properties of the HfFe2Si2 compound
VL  - 23
IS  - 2
DO  - 10.30970/jps.23.2301
UR  - https://hdl.handle.net/21.15107/rcub_dais_6952
ER  - 
@article{
author = "Shcherba, I. D. and Antonov, V. N. and Zhak, O. V. and Bekenov, L. V. and Kovalska, M. V. and Noga, H. and Uskoković, Dragan and Yatcyk, B. M.",
year = "2019",
abstract = "The valence band electronic structure of HfFe2Si2 has been established for the first time based on X-ray emission spectroscopy measurements. The band structure and X-ray emission spectra have been also obtained theoretically using the ab initio LMTO method in the non-relativistic approximation. The electron configuration of Si in the compound HfFe2Si2 can be described as $s^{1.1}p^{1.5}$. The theoretical and experimental results are in satisfactory agreement.",
publisher = "West Ukrainian Physical Society",
journal = "Journal of Physical Studies",
title = "Electronic structure and X-ray spectroscopic properties of the HfFe2Si2 compound",
volume = "23",
number = "2",
doi = "10.30970/jps.23.2301",
url = "https://hdl.handle.net/21.15107/rcub_dais_6952"
}
Shcherba, I. D., Antonov, V. N., Zhak, O. V., Bekenov, L. V., Kovalska, M. V., Noga, H., Uskoković, D.,& Yatcyk, B. M.. (2019). Electronic structure and X-ray spectroscopic properties of the HfFe2Si2 compound. in Journal of Physical Studies
West Ukrainian Physical Society., 23(2).
https://doi.org/10.30970/jps.23.2301
https://hdl.handle.net/21.15107/rcub_dais_6952
Shcherba ID, Antonov VN, Zhak OV, Bekenov LV, Kovalska MV, Noga H, Uskoković D, Yatcyk BM. Electronic structure and X-ray spectroscopic properties of the HfFe2Si2 compound. in Journal of Physical Studies. 2019;23(2).
doi:10.30970/jps.23.2301
https://hdl.handle.net/21.15107/rcub_dais_6952 .
Shcherba, I. D., Antonov, V. N., Zhak, O. V., Bekenov, L. V., Kovalska, M. V., Noga, H., Uskoković, Dragan, Yatcyk, B. M., "Electronic structure and X-ray spectroscopic properties of the HfFe2Si2 compound" in Journal of Physical Studies, 23, no. 2 (2019),
https://doi.org/10.30970/jps.23.2301 .,
https://hdl.handle.net/21.15107/rcub_dais_6952 .

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