Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors
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Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.
Keywords:
adsorption–desorption / semiconductors / nanocantilever sensorsSource:
2012 28th International Conference on Microelectronics (MIEL), 2012, 161-164Publisher:
- IEEE
Funding / projects:
- Micro- Nanosystems and Sensors for Electric Power and Process Industry and Environmental Protection (RS-32008)
Institution/Community
Институт техничких наука САНУ / Institute of Technical Sciences of SASATY - CONF AU - Đurić, Zoran G. AU - Radulović, Katarina AU - Jokić, Ivana AU - Frantlović, Miloš PY - 2012 UR - https://dais.sanu.ac.rs/123456789/449 AB - Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces. PB - IEEE C3 - 2012 28th International Conference on Microelectronics (MIEL) T1 - Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors SP - 161 EP - 164 DO - 10.1109/MIEL.2012.6222823 UR - https://hdl.handle.net/21.15107/rcub_dais_449 ER -
@conference{ author = "Đurić, Zoran G. and Radulović, Katarina and Jokić, Ivana and Frantlović, Miloš", year = "2012", abstract = "Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.", publisher = "IEEE", journal = "2012 28th International Conference on Microelectronics (MIEL)", title = "Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors", pages = "161-164", doi = "10.1109/MIEL.2012.6222823", url = "https://hdl.handle.net/21.15107/rcub_dais_449" }
Đurić, Z. G., Radulović, K., Jokić, I.,& Frantlović, M.. (2012). Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors. in 2012 28th International Conference on Microelectronics (MIEL) IEEE., 161-164. https://doi.org/10.1109/MIEL.2012.6222823 https://hdl.handle.net/21.15107/rcub_dais_449
Đurić ZG, Radulović K, Jokić I, Frantlović M. Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors. in 2012 28th International Conference on Microelectronics (MIEL). 2012;:161-164. doi:10.1109/MIEL.2012.6222823 https://hdl.handle.net/21.15107/rcub_dais_449 .
Đurić, Zoran G., Radulović, Katarina, Jokić, Ivana, Frantlović, Miloš, "Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors" in 2012 28th International Conference on Microelectronics (MIEL) (2012):161-164, https://doi.org/10.1109/MIEL.2012.6222823 ., https://hdl.handle.net/21.15107/rcub_dais_449 .