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Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors

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2012
Djuric_28MIEL2012.pdf (794.4Kb)
Authors
Đurić, Zoran G.
Radulović, Katarina
Jokić, Ivana
Frantlović, Miloš
Conference object (Published version)
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Abstract
Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.
Keywords:
adsorption–desorption / semiconductors / nanocantilever sensors
Source:
2012 28th International Conference on Microelectronics (MIEL), 2012, 161-164
Publisher:
  • IEEE
Funding / projects:
  • Micro- Nanosystems and Sensors for Electric Power and Process Industry and Environmental Protection (RS-32008)

DOI: 10.1109/MIEL.2012.6222823

ISBN: 9781467302371

Scopus: 2-s2.0-84864227934
[ Google Scholar ]
Handle
https://hdl.handle.net/21.15107/rcub_dais_449
URI
https://dais.sanu.ac.rs/123456789/449
Collections
  • ИТН САНУ - Општа колекција / ITS SASA - General collection
Institution/Community
Институт техничких наука САНУ / Institute of Technical Sciences of SASA
TY  - CONF
AU  - Đurić, Zoran G.
AU  - Radulović, Katarina
AU  - Jokić, Ivana
AU  - Frantlović, Miloš
PY  - 2012
UR  - https://dais.sanu.ac.rs/123456789/449
AB  - Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.
PB  - IEEE
C3  - 2012 28th International Conference on Microelectronics (MIEL)
T1  - Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors
SP  - 161
EP  - 164
DO  - 10.1109/MIEL.2012.6222823
UR  - https://hdl.handle.net/21.15107/rcub_dais_449
ER  - 
@conference{
author = "Đurić, Zoran G. and Radulović, Katarina and Jokić, Ivana and Frantlović, Miloš",
year = "2012",
abstract = "Characterization of adsorption-desorption (AD) processes of gas particles on semiconductors is necessary in order to investigate the influence of these processes on the micro/nano-devices performance. By applying a numerical computational method we determined the pressure dependence of the equilibrium coverage of the semiconductor surface by chemisorbed gas particles. We concluded that the pressure dependence of the total coverage of the surface by adparticles, and also of coverages by both the neutral and ionized adparticles, can be obtained by measuring the adsorbed mass. We propose the use of nanocantilever sensors for such extremely sensitive mass measurements. The obtained adsorption induced cantilever's resonant frequency shifts are higher than the detection threshold set by the termomechanical noise. This confirms the applicability of the used nanocantilever sensor for experimental characterization of AD processes at semiconductor surfaces.",
publisher = "IEEE",
journal = "2012 28th International Conference on Microelectronics (MIEL)",
title = "Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors",
pages = "161-164",
doi = "10.1109/MIEL.2012.6222823",
url = "https://hdl.handle.net/21.15107/rcub_dais_449"
}
Đurić, Z. G., Radulović, K., Jokić, I.,& Frantlović, M.. (2012). Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors. in 2012 28th International Conference on Microelectronics (MIEL)
IEEE., 161-164.
https://doi.org/10.1109/MIEL.2012.6222823
https://hdl.handle.net/21.15107/rcub_dais_449
Đurić ZG, Radulović K, Jokić I, Frantlović M. Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors. in 2012 28th International Conference on Microelectronics (MIEL). 2012;:161-164.
doi:10.1109/MIEL.2012.6222823
https://hdl.handle.net/21.15107/rcub_dais_449 .
Đurić, Zoran G., Radulović, Katarina, Jokić, Ivana, Frantlović, Miloš, "Characterization of adsorption-desorption processes on semiconductor surfaces using nanocantilever mass sensors" in 2012 28th International Conference on Microelectronics (MIEL) (2012):161-164,
https://doi.org/10.1109/MIEL.2012.6222823 .,
https://hdl.handle.net/21.15107/rcub_dais_449 .

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