Preparation of TiO2 and ZnO thin films by dip-coating method
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1998
Authors
Ignjatović, Nenad
Branković, Zorica

Dramićanin, Miroslav

Nedeljković, Jovan

Uskoković, Dragan

Conference object (Published version)

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TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.
Keywords:
dip-coating / thin film / ZnO / TiO2 / AFMSource:
Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia, 1998, 147-152Note:
- Materials Science Forum, Volume 282-283
DOI: 10.4028/www.scientific.net/MSF.282-283.147
ISSN: 0255-5476 (print)
WoS: 000075079900020
[ Google Scholar ]Institution/Community
Институт техничких наука САНУ / Institute of Technical Sciences of SASATY - CONF AU - Ignjatović, Nenad AU - Branković, Zorica AU - Dramićanin, Miroslav AU - Nedeljković, Jovan AU - Uskoković, Dragan PY - 1998 UR - https://dais.sanu.ac.rs/123456789/2751 AB - TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method. C3 - Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia T1 - Preparation of TiO2 and ZnO thin films by dip-coating method SP - 147 EP - 152 DO - 10.4028/www.scientific.net/MSF.282-283.147 UR - https://hdl.handle.net/21.15107/rcub_dais_2751 ER -
@conference{ author = "Ignjatović, Nenad and Branković, Zorica and Dramićanin, Miroslav and Nedeljković, Jovan and Uskoković, Dragan", year = "1998", abstract = "TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.", journal = "Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia", title = "Preparation of TiO2 and ZnO thin films by dip-coating method", pages = "147-152", doi = "10.4028/www.scientific.net/MSF.282-283.147", url = "https://hdl.handle.net/21.15107/rcub_dais_2751" }
Ignjatović, N., Branković, Z., Dramićanin, M., Nedeljković, J.,& Uskoković, D.. (1998). Preparation of TiO2 and ZnO thin films by dip-coating method. in Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia, 147-152. https://doi.org/10.4028/www.scientific.net/MSF.282-283.147 https://hdl.handle.net/21.15107/rcub_dais_2751
Ignjatović N, Branković Z, Dramićanin M, Nedeljković J, Uskoković D. Preparation of TiO2 and ZnO thin films by dip-coating method. in Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia. 1998;:147-152. doi:10.4028/www.scientific.net/MSF.282-283.147 https://hdl.handle.net/21.15107/rcub_dais_2751 .
Ignjatović, Nenad, Branković, Zorica, Dramićanin, Miroslav, Nedeljković, Jovan, Uskoković, Dragan, "Preparation of TiO2 and ZnO thin films by dip-coating method" in Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia (1998):147-152, https://doi.org/10.4028/www.scientific.net/MSF.282-283.147 ., https://hdl.handle.net/21.15107/rcub_dais_2751 .