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Preparation of TiO2 and ZnO thin films by dip-coating method

Authorized Users Only
1998
Authors
Ignjatović, Nenad
Branković, Zorica
Dramićanin, Miroslav
Nedeljković, Jovan
Uskoković, Dragan
Conference object (Published version)
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Abstract
TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.
Keywords:
dip-coating / thin film / ZnO / TiO2 / AFM
Source:
Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia, 1998, 147-152
Note:
  • Materials Science Forum, Volume 282-283

DOI: 10.4028/www.scientific.net/MSF.282-283.147

ISSN: 0255-5476 (print)

WoS: 000075079900020

[ Google Scholar ]
5
Handle
https://hdl.handle.net/21.15107/rcub_dais_2751
URI
https://dais.sanu.ac.rs/123456789/2751
Collections
  • ИТН САНУ - Општа колекција / ITS SASA - General collection
Institution/Community
Институт техничких наука САНУ / Institute of Technical Sciences of SASA
TY  - CONF
AU  - Ignjatović, Nenad
AU  - Branković, Zorica
AU  - Dramićanin, Miroslav
AU  - Nedeljković, Jovan
AU  - Uskoković, Dragan
PY  - 1998
UR  - https://dais.sanu.ac.rs/123456789/2751
AB  - TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.
C3  - Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia
T1  - Preparation of TiO2 and ZnO thin films by dip-coating method
SP  - 147
EP  - 152
DO  - 10.4028/www.scientific.net/MSF.282-283.147
UR  - https://hdl.handle.net/21.15107/rcub_dais_2751
ER  - 
@conference{
author = "Ignjatović, Nenad and Branković, Zorica and Dramićanin, Miroslav and Nedeljković, Jovan and Uskoković, Dragan",
year = "1998",
abstract = "TiO2 and ZnO thin films were prepared by dip-coating method from TiCl4, and Zn(NO3)(2) precursor solutions, respectively. Basic parameters of the process such as temperature of thermal treatment, heating and cooling regimes, and number of cycles required for obtaining uniformly coated substrates were defined. Microstructural analysis showed that at least 20 cycles must be repeated to obtain a completely covered substrate and continual film of TiO2 at 823 K. In the case of TiO2 film thermally treated at 723 K even n=30 was not enough to produce a continual film. Preparation of continual film of ZnO requires at least n=22, at 773 K. Microstructure and roughness of the prepared films were investigated by AFM method.",
journal = "Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia",
title = "Preparation of TiO2 and ZnO thin films by dip-coating method",
pages = "147-152",
doi = "10.4028/www.scientific.net/MSF.282-283.147",
url = "https://hdl.handle.net/21.15107/rcub_dais_2751"
}
Ignjatović, N., Branković, Z., Dramićanin, M., Nedeljković, J.,& Uskoković, D.. (1998). Preparation of TiO2 and ZnO thin films by dip-coating method. in Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia, 147-152.
https://doi.org/10.4028/www.scientific.net/MSF.282-283.147
https://hdl.handle.net/21.15107/rcub_dais_2751
Ignjatović N, Branković Z, Dramićanin M, Nedeljković J, Uskoković D. Preparation of TiO2 and ZnO thin films by dip-coating method. in Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia. 1998;:147-152.
doi:10.4028/www.scientific.net/MSF.282-283.147
https://hdl.handle.net/21.15107/rcub_dais_2751 .
Ignjatović, Nenad, Branković, Zorica, Dramićanin, Miroslav, Nedeljković, Jovan, Uskoković, Dragan, "Preparation of TiO2 and ZnO thin films by dip-coating method" in Advanced Materials and Processes, 2nd Yugoslav Conference on Advanced Materials (YUGOMAT II), Sep 15-19, 1997, Herceg Novi, Yugoslavia (1998):147-152,
https://doi.org/10.4028/www.scientific.net/MSF.282-283.147 .,
https://hdl.handle.net/21.15107/rcub_dais_2751 .

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