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dc.creatorKlute, Michael
dc.creatorKemaneci, Efe
dc.creatorPorteanu, Horia-Eugen
dc.creatorStefanović, Ilija
dc.creatorHeinrich, Wolfgang
dc.creatorAwakowicz, Peter
dc.creatorBrinkmann, Ralf Peter
dc.date.accessioned2021-08-12T11:51:28Z
dc.date.available2021-08-12T11:51:28Z
dc.date.issued2021
dc.identifier.issn0963-0252
dc.identifier.issn1361-6595
dc.identifier.urihttps://dais.sanu.ac.rs/123456789/11799
dc.description.abstractThe MMWICP (miniature microwave ICP) is a new plasma source using the induction principle. Recently Klute et al presented a mathematical model for the electromagnetic fields and power balance of the new device. In this work the electromagnetic model is coupled with a global chemistry model for nitrogen, based on the chemical reaction set of Thorsteinsson and Gudmundsson and customized for the geometry of the MMWICP. The combined model delivers a quantitative description for a non-thermal plasma at a pressure of p = 1000 Pa and a gas temperature of Tg = 650–1600 K. Comparison with published experimental data shows a good agreement for the volume averaged plasma parameters at high power, for the spatial distribution of the discharge and for the microwave measurements. Furthermore, the balance of capacitive and inductive coupling in the absorbed power is analyzed. This leads to the interpretation of the discharge regime at an electron density of ne ≈ 6.4 × 1018 m−3 as E/H-hybridmode with an capacitive and inductive component.
dc.publisherIOP Publishing
dc.relationDeutsche Forschungsgemeinschaft, SFB 1316
dc.relationhttp://dx.doi.org/10.13039/501100001659
dc.rightsopenAccess
dc.rights.urihttps://creativecommons.org/licenses/by/4.0/
dc.sourcePlasma Sources Science and Technology
dc.subjectMMWICP
dc.subjectminiature microwave ICP
dc.subjectnitrogen plasma
dc.titleModelling of a miniature microwave driven nitrogen plasma jet and comparison to measurements
dc.typearticleen
dc.rights.licenseBY
dcterms.abstractAwакоwицз, Петер; Стефановић, Илија; Портеану, Хориа-Еуген; Бринкманн, Ралф Петер; Кеманеци, Ефе; Хеинрицх, Wолфганг; Клуте, Мицхаел;
dc.citation.spage065014
dc.citation.volume30
dc.citation.issue6
dc.identifier.wos000665028900001
dc.identifier.doi10.1088/1361-6595/ac04bc
dc.identifier.scopus2-s2.0-85109103726
dc.type.versionpublishedVersion
dc.identifier.fulltexthttps://dais.sanu.ac.rs/bitstream/id/47006/Klute_2021_Plasma_Sources_Sci._Technol._30_065014.pdf
dc.identifier.rcubhttps://hdl.handle.net/21.15107/rcub_dais_11799


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