TY  - JOUR
AU  - Popović, M.
AU  - Novaković, M.
AU  - Pjević, Dejan J.
AU  - Vaňa, Dušan
AU  - Jugović, Dragana
AU  - Tošić, D.
AU  - Noga, Pavol
PY  - 2024
UR  - https://dais.sanu.ac.rs/123456789/16162
AB  - In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.
PB  - Elsevier
T2  - Journal of Alloys and Compounds
T1  - Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects
SP  - 173046
VL  - 976
DO  - 10.1016/j.jallcom.2023.173046
UR  - https://hdl.handle.net/21.15107/rcub_dais_16162
ER  - 

@article{
author = "Popović, M. and Novaković, M. and Pjević, Dejan J. and Vaňa, Dušan and Jugović, Dragana and Tošić, D. and Noga, Pavol",
year = "2024",
abstract = "In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.",
publisher = "Elsevier",
journal = "Journal of Alloys and Compounds",
title = "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects",
pages = "173046",
volume = "976",
doi = "10.1016/j.jallcom.2023.173046",
url = "https://hdl.handle.net/21.15107/rcub_dais_16162"
}

Popović, M., Novaković, M., Pjević, D. J., Vaňa, D., Jugović, D., Tošić, D.,& Noga, P.. (2024). Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds
Elsevier., 976, 173046.
https://doi.org/10.1016/j.jallcom.2023.173046
https://hdl.handle.net/21.15107/rcub_dais_16162

Popović M, Novaković M, Pjević DJ, Vaňa D, Jugović D, Tošić D, Noga P. Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds. 2024;976:173046.
doi:10.1016/j.jallcom.2023.173046
https://hdl.handle.net/21.15107/rcub_dais_16162 .

Popović, M., Novaković, M., Pjević, Dejan J., Vaňa, Dušan, Jugović, Dragana, Tošić, D., Noga, Pavol, "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects" in Journal of Alloys and Compounds, 976 (2024):173046,
https://doi.org/10.1016/j.jallcom.2023.173046 .,
https://hdl.handle.net/21.15107/rcub_dais_16162 .

TY  - CONF
AU  - Popović, M.
AU  - Novaković, M.
AU  - Pjević, Dejan J.
AU  - Vaňa, Dušan
AU  - Jugović, Dragana
AU  - Noga, Pavol
PY  - 2023
UR  - https://dais.sanu.ac.rs/123456789/14869
AB  - The ion implantation technique has a number of advantages over conventional methods for the improvement of thin films that offer the various possibilities of their use in different industrial and technological fields. Herein, we present the effects of metal ion implantation on the structural and optical properties of TiN thin films. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5×1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in form of fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers the cubic crystallographic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. Besides, the surface compositional analysis of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in the crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For as deposited film we found energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, additional energy levels, at photon energies below 2.9 eV were observed. Further, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag-implanted films compared to Cu implantations was ascribed to larger structural defects and formation of less favorable electronic states.
PB  - Belgrade : Vinča Institute of Nuclear Sciences – National Institute of the Republic of Serbia, University of Belgrade
C3  - Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia
T1  - Metal ion-implanted TiN thin films: Induced effects on structural and optical properties
SP  - 63
EP  - 63
UR  - https://hdl.handle.net/21.15107/rcub_dais_14869
ER  - 

@conference{
author = "Popović, M. and Novaković, M. and Pjević, Dejan J. and Vaňa, Dušan and Jugović, Dragana and Noga, Pavol",
year = "2023",
abstract = "The ion implantation technique has a number of advantages over conventional methods for the improvement of thin films that offer the various possibilities of their use in different industrial and technological fields. Herein, we present the effects of metal ion implantation on the structural and optical properties of TiN thin films. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5×1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in form of fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers the cubic crystallographic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. Besides, the surface compositional analysis of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in the crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For as deposited film we found energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, additional energy levels, at photon energies below 2.9 eV were observed. Further, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag-implanted films compared to Cu implantations was ascribed to larger structural defects and formation of less favorable electronic states.",
publisher = "Belgrade : Vinča Institute of Nuclear Sciences – National Institute of the Republic of Serbia, University of Belgrade",
journal = "Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia",
title = "Metal ion-implanted TiN thin films: Induced effects on structural and optical properties",
pages = "63-63",
url = "https://hdl.handle.net/21.15107/rcub_dais_14869"
}

Popović, M., Novaković, M., Pjević, D. J., Vaňa, D., Jugović, D.,& Noga, P.. (2023). Metal ion-implanted TiN thin films: Induced effects on structural and optical properties. in Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia
Belgrade : Vinča Institute of Nuclear Sciences – National Institute of the Republic of Serbia, University of Belgrade., 63-63.
https://hdl.handle.net/21.15107/rcub_dais_14869

Popović M, Novaković M, Pjević DJ, Vaňa D, Jugović D, Noga P. Metal ion-implanted TiN thin films: Induced effects on structural and optical properties. in Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia. 2023;:63-63.
https://hdl.handle.net/21.15107/rcub_dais_14869 .

Popović, M., Novaković, M., Pjević, Dejan J., Vaňa, Dušan, Jugović, Dragana, Noga, Pavol, "Metal ion-implanted TiN thin films: Induced effects on structural and optical properties" in Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia (2023):63-63,
https://hdl.handle.net/21.15107/rcub_dais_14869 .

TY  - JOUR
AU  - Milićević, Nemanja
AU  - Novaković, Mirjana M.
AU  - Potočnik, Jelena
AU  - Milović, Miloš
AU  - Rakočević, Lazar
AU  - Abazović, Nadica
AU  - Pjević, Dejan J.
PY  - 2022
UR  - https://dais.sanu.ac.rs/123456789/12946
AB  - Enhanced optical properties of TiO2 thin films can be achieved by doping or coating with metals. Metal-doped TiO2 can reduce electron-hole recombination and increase hydroxyl radical concentration on the surface of TiO2, resulting in increase of the photocatalytic activity. TiO2 and TiO2-Au thin films were obtained by DC magnetron sputtering of Ti target with Ar ions in O2 atmosphere. In the case of Au buffered TiO2 thin films, two different systems were deposited for comparison. Post deposition annealing at 400 °C was carried out in nitrogen atmosphere for 3 h. The structural and optical characteristics of the prepared films were investigated in detail by the combination of high-resolution microscopic and spectroscopic techniques. The photo-degradation rate was measured using Rhodamine B which simulated pollutant. Post deposition annealing resulted in diffusion of Au atoms through the layer as it was revealed by transmission electron microscopy and energy dispersive X-ray spectroscopy. The obtained TiO2 thin films were found to be amorphous after deposition and annealing at 400 °C leads to crystallization of anatase phase. Analysis of the binding energy in the corresponding X-ray photoelectron spectra has confirmed stoichiometry of TiO2 and that concentration of Au on the surface can be controlled by sputtering and annealing conditions, thus changing optical properties by influencing the surface plasmonic nature. All Au doped TiO2 thin films exhibited enhanced wettability and photo-degradation rates when compared to pristine titania films. © 2022 Elsevier B.V.
T2  - Surfaces and Interfaces
T1  - Influencing surface phenomena by Au diffusion in buffered TiO2-Au thin films: Effects of deposition and annealing processing
SP  - 101811
VL  - 30
DO  - 10.1016/j.surfin.2022.101811
UR  - https://hdl.handle.net/21.15107/rcub_dais_12946
ER  - 

@article{
author = "Milićević, Nemanja and Novaković, Mirjana M. and Potočnik, Jelena and Milović, Miloš and Rakočević, Lazar and Abazović, Nadica and Pjević, Dejan J.",
year = "2022",
abstract = "Enhanced optical properties of TiO2 thin films can be achieved by doping or coating with metals. Metal-doped TiO2 can reduce electron-hole recombination and increase hydroxyl radical concentration on the surface of TiO2, resulting in increase of the photocatalytic activity. TiO2 and TiO2-Au thin films were obtained by DC magnetron sputtering of Ti target with Ar ions in O2 atmosphere. In the case of Au buffered TiO2 thin films, two different systems were deposited for comparison. Post deposition annealing at 400 °C was carried out in nitrogen atmosphere for 3 h. The structural and optical characteristics of the prepared films were investigated in detail by the combination of high-resolution microscopic and spectroscopic techniques. The photo-degradation rate was measured using Rhodamine B which simulated pollutant. Post deposition annealing resulted in diffusion of Au atoms through the layer as it was revealed by transmission electron microscopy and energy dispersive X-ray spectroscopy. The obtained TiO2 thin films were found to be amorphous after deposition and annealing at 400 °C leads to crystallization of anatase phase. Analysis of the binding energy in the corresponding X-ray photoelectron spectra has confirmed stoichiometry of TiO2 and that concentration of Au on the surface can be controlled by sputtering and annealing conditions, thus changing optical properties by influencing the surface plasmonic nature. All Au doped TiO2 thin films exhibited enhanced wettability and photo-degradation rates when compared to pristine titania films. © 2022 Elsevier B.V.",
journal = "Surfaces and Interfaces",
title = "Influencing surface phenomena by Au diffusion in buffered TiO2-Au thin films: Effects of deposition and annealing processing",
pages = "101811",
volume = "30",
doi = "10.1016/j.surfin.2022.101811",
url = "https://hdl.handle.net/21.15107/rcub_dais_12946"
}

Milićević, N., Novaković, M. M., Potočnik, J., Milović, M., Rakočević, L., Abazović, N.,& Pjević, D. J.. (2022). Influencing surface phenomena by Au diffusion in buffered TiO2-Au thin films: Effects of deposition and annealing processing. in Surfaces and Interfaces, 30, 101811.
https://doi.org/10.1016/j.surfin.2022.101811
https://hdl.handle.net/21.15107/rcub_dais_12946

Milićević N, Novaković MM, Potočnik J, Milović M, Rakočević L, Abazović N, Pjević DJ. Influencing surface phenomena by Au diffusion in buffered TiO2-Au thin films: Effects of deposition and annealing processing. in Surfaces and Interfaces. 2022;30:101811.
doi:10.1016/j.surfin.2022.101811
https://hdl.handle.net/21.15107/rcub_dais_12946 .

Milićević, Nemanja, Novaković, Mirjana M., Potočnik, Jelena, Milović, Miloš, Rakočević, Lazar, Abazović, Nadica, Pjević, Dejan J., "Influencing surface phenomena by Au diffusion in buffered TiO2-Au thin films: Effects of deposition and annealing processing" in Surfaces and Interfaces, 30 (2022):101811,
https://doi.org/10.1016/j.surfin.2022.101811 .,
https://hdl.handle.net/21.15107/rcub_dais_12946 .