TY  - JOUR
AU  - Popović, M.
AU  - Novaković, M.
AU  - Pjević, Dejan J.
AU  - Vaňa, Dušan
AU  - Jugović, Dragana
AU  - Tošić, D.
AU  - Noga, Pavol
PY  - 2024
UR  - https://dais.sanu.ac.rs/123456789/16162
AB  - In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.
PB  - Elsevier
T2  - Journal of Alloys and Compounds
T1  - Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects
SP  - 173046
VL  - 976
DO  - 10.1016/j.jallcom.2023.173046
UR  - https://hdl.handle.net/21.15107/rcub_dais_16162
ER  - 

@article{
author = "Popović, M. and Novaković, M. and Pjević, Dejan J. and Vaňa, Dušan and Jugović, Dragana and Tošić, D. and Noga, Pavol",
year = "2024",
abstract = "In the present paper, the effects of metal ion implantation on the structural and optical properties of TiN thin films have been investigated. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5 × 1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in the form of a fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers, the cubic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. These changes were correlated with the depth distribution of Au, Ag and Cu ions and assigned to implantation-induced damage that was larger when higher ion energies were used. High-resolution XPS spectra of the surface of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For the as deposited film we found an energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, the existence of additional energy levels, at photon energies below 2.9 eV was observed. Besides, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag implanted films compared to Cu implantations was ascribed to larger structural defects and the formation of less favorable electronic states.",
publisher = "Elsevier",
journal = "Journal of Alloys and Compounds",
title = "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects",
pages = "173046",
volume = "976",
doi = "10.1016/j.jallcom.2023.173046",
url = "https://hdl.handle.net/21.15107/rcub_dais_16162"
}

Popović, M., Novaković, M., Pjević, D. J., Vaňa, D., Jugović, D., Tošić, D.,& Noga, P.. (2024). Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds
Elsevier., 976, 173046.
https://doi.org/10.1016/j.jallcom.2023.173046
https://hdl.handle.net/21.15107/rcub_dais_16162

Popović M, Novaković M, Pjević DJ, Vaňa D, Jugović D, Tošić D, Noga P. Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects. in Journal of Alloys and Compounds. 2024;976:173046.
doi:10.1016/j.jallcom.2023.173046
https://hdl.handle.net/21.15107/rcub_dais_16162 .

Popović, M., Novaković, M., Pjević, Dejan J., Vaňa, Dušan, Jugović, Dragana, Tošić, D., Noga, Pavol, "Investigating on the microstructure and optical properties of Au, Ag and Cu implanted TiN thin films: The effects of surface oxidation and ion-induced defects" in Journal of Alloys and Compounds, 976 (2024):173046,
https://doi.org/10.1016/j.jallcom.2023.173046 .,
https://hdl.handle.net/21.15107/rcub_dais_16162 .

TY  - CONF
AU  - Popović, M.
AU  - Novaković, M.
AU  - Pjević, Dejan J.
AU  - Vaňa, Dušan
AU  - Jugović, Dragana
AU  - Noga, Pavol
PY  - 2023
UR  - https://dais.sanu.ac.rs/123456789/14869
AB  - The ion implantation technique has a number of advantages over conventional methods for the improvement of thin films that offer the various possibilities of their use in different industrial and technological fields. Herein, we present the effects of metal ion implantation on the structural and optical properties of TiN thin films. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5×1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in form of fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers the cubic crystallographic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. Besides, the surface compositional analysis of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in the crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For as deposited film we found energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, additional energy levels, at photon energies below 2.9 eV were observed. Further, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag-implanted films compared to Cu implantations was ascribed to larger structural defects and formation of less favorable electronic states.
PB  - Belgrade : Vinča Institute of Nuclear Sciences – National Institute of the Republic of Serbia, University of Belgrade
C3  - Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia
T1  - Metal ion-implanted TiN thin films: Induced effects on structural and optical properties
SP  - 63
EP  - 63
UR  - https://hdl.handle.net/21.15107/rcub_dais_14869
ER  - 

@conference{
author = "Popović, M. and Novaković, M. and Pjević, Dejan J. and Vaňa, Dušan and Jugović, Dragana and Noga, Pavol",
year = "2023",
abstract = "The ion implantation technique has a number of advantages over conventional methods for the improvement of thin films that offer the various possibilities of their use in different industrial and technological fields. Herein, we present the effects of metal ion implantation on the structural and optical properties of TiN thin films. TiN films of 170 nm thickness were grown by d.c. reactive sputtering on Si (100) wafers and then irradiated at 5×1016 ions/cm2 with either Au, Ag, or Cu ions by using two different energies per each implanted metal. The results showed that as deposited TiN crystallizes in form of fcc cubic structure, with the crystallites preferentially oriented along the (111) plane. For all implanted layers the cubic crystallographic structure was preserved, but compared to as deposited TiN the crystallites were smaller and the lattice was contracted. Besides, the surface compositional analysis of as deposited sample showed the coexistence of TiN, TiO2 and TiOxNy phases and this was related to the surface oxidation of the films due to the exposure to air. After implantation, the results were almost similar for all metals, showing an increase in TiO2 contribution and the formation of pure metallic Au and Ag phases, while copper is in the Cu2+ state, which is attributed to Cu(II)-oxide and Cu(OH)2. The microstructural characteristics including defect formation, changes in the crystallite size and lattice contraction, and also growth of different metallic phases during implantations were correlated with the findings of the optical characterization of the implanted films. For as deposited film we found energy gap of 2.91 eV, which was lower than the value typical for TiN. After implantation the gap was shifted to higher energies, while at the visible part of the region, additional energy levels, at photon energies below 2.9 eV were observed. Further, all implanted films showed degraded photocatalytic activity compared to as deposited TiN, among which Cu-implanted samples exhibited the best photocatalytic performances. The lower photocatalytic activity of Au and Ag-implanted films compared to Cu implantations was ascribed to larger structural defects and formation of less favorable electronic states.",
publisher = "Belgrade : Vinča Institute of Nuclear Sciences – National Institute of the Republic of Serbia, University of Belgrade",
journal = "Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia",
title = "Metal ion-implanted TiN thin films: Induced effects on structural and optical properties",
pages = "63-63",
url = "https://hdl.handle.net/21.15107/rcub_dais_14869"
}

Popović, M., Novaković, M., Pjević, D. J., Vaňa, D., Jugović, D.,& Noga, P.. (2023). Metal ion-implanted TiN thin films: Induced effects on structural and optical properties. in Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia
Belgrade : Vinča Institute of Nuclear Sciences – National Institute of the Republic of Serbia, University of Belgrade., 63-63.
https://hdl.handle.net/21.15107/rcub_dais_14869

Popović M, Novaković M, Pjević DJ, Vaňa D, Jugović D, Noga P. Metal ion-implanted TiN thin films: Induced effects on structural and optical properties. in Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia. 2023;:63-63.
https://hdl.handle.net/21.15107/rcub_dais_14869 .

Popović, M., Novaković, M., Pjević, Dejan J., Vaňa, Dušan, Jugović, Dragana, Noga, Pavol, "Metal ion-implanted TiN thin films: Induced effects on structural and optical properties" in Book of abstracts / IX International School and Conference on Photonics PHOTONICA2023 with joint events: Understanding interaction light - biological surfaces possibility for new electronic materials and devices & Biological and bioinspired structures for multispectral surveillance & Quantum sensing integration within microfluidic Lab-on-a Chips for biomedical applications, August 28 - September 01, 2023, Belgrade, Serbia (2023):63-63,
https://hdl.handle.net/21.15107/rcub_dais_14869 .

TY  - JOUR
AU  - Popović, Maja
AU  - Novaković, Mirjana
AU  - Vaňa, Dušan
AU  - Ronning, Carsten
AU  - Jugović, Dragana
AU  - Rajić, Vladimir
AU  - Noga, Pavol
PY  - 2023
UR  - https://dais.sanu.ac.rs/123456789/14289
AB  - Titanium nitride (TiN) is an attractive alternative for modern and future photonic applications, as its optical properties can be engineered over a wide spectral range. In this study, we have used sequential implantation of gold and silver ions with varying ion fluence, as well as subsequent annealing, in order to modify the optical and plasmonic properties of TiN thin films and correlated this to their structural properties. Our investigations show that the columnar structure of the TiN films is partially destroyed upon implantation, but metallic Au and Ag nanoparticles are formed. The irradiation further induces a reduction of the lattice constant as well as changes the TiN stoichiometry and grain size. From the optical point of view, the implanted films possess less metallicity with increasing Ag fluence and losses several times lower than the as-deposited film, which can be correlated with the deficiency of nitrogen and additional defects. Subsequent annealing partially recovered the destroyed columnar structure, and the films become more metallic where the optical losses are much smaller in comparison to the as-implanted situation, being comparable to those of pure Au and Ag. In this way, by varying the implantation fluence of silver ions properly while keeping the gold fluence constant, we were able to optimize experimental parameters in such a way to ensure the formation of TiN with desirable optical performances.
PB  - Elsevier BV
T2  - Optical Materials
T1  - Structure-dependent optical properties of Au/Ag irradiated TiN thin films
SP  - 113684
VL  - 138
DO  - 10.1016/j.optmat.2023.113684
UR  - https://hdl.handle.net/21.15107/rcub_dais_14289
ER  - 

@article{
author = "Popović, Maja and Novaković, Mirjana and Vaňa, Dušan and Ronning, Carsten and Jugović, Dragana and Rajić, Vladimir and Noga, Pavol",
year = "2023",
abstract = "Titanium nitride (TiN) is an attractive alternative for modern and future photonic applications, as its optical properties can be engineered over a wide spectral range. In this study, we have used sequential implantation of gold and silver ions with varying ion fluence, as well as subsequent annealing, in order to modify the optical and plasmonic properties of TiN thin films and correlated this to their structural properties. Our investigations show that the columnar structure of the TiN films is partially destroyed upon implantation, but metallic Au and Ag nanoparticles are formed. The irradiation further induces a reduction of the lattice constant as well as changes the TiN stoichiometry and grain size. From the optical point of view, the implanted films possess less metallicity with increasing Ag fluence and losses several times lower than the as-deposited film, which can be correlated with the deficiency of nitrogen and additional defects. Subsequent annealing partially recovered the destroyed columnar structure, and the films become more metallic where the optical losses are much smaller in comparison to the as-implanted situation, being comparable to those of pure Au and Ag. In this way, by varying the implantation fluence of silver ions properly while keeping the gold fluence constant, we were able to optimize experimental parameters in such a way to ensure the formation of TiN with desirable optical performances.",
publisher = "Elsevier BV",
journal = "Optical Materials",
title = "Structure-dependent optical properties of Au/Ag irradiated TiN thin films",
pages = "113684",
volume = "138",
doi = "10.1016/j.optmat.2023.113684",
url = "https://hdl.handle.net/21.15107/rcub_dais_14289"
}

Popović, M., Novaković, M., Vaňa, D., Ronning, C., Jugović, D., Rajić, V.,& Noga, P.. (2023). Structure-dependent optical properties of Au/Ag irradiated TiN thin films. in Optical Materials
Elsevier BV., 138, 113684.
https://doi.org/10.1016/j.optmat.2023.113684
https://hdl.handle.net/21.15107/rcub_dais_14289

Popović M, Novaković M, Vaňa D, Ronning C, Jugović D, Rajić V, Noga P. Structure-dependent optical properties of Au/Ag irradiated TiN thin films. in Optical Materials. 2023;138:113684.
doi:10.1016/j.optmat.2023.113684
https://hdl.handle.net/21.15107/rcub_dais_14289 .

Popović, Maja, Novaković, Mirjana, Vaňa, Dušan, Ronning, Carsten, Jugović, Dragana, Rajić, Vladimir, Noga, Pavol, "Structure-dependent optical properties of Au/Ag irradiated TiN thin films" in Optical Materials, 138 (2023):113684,
https://doi.org/10.1016/j.optmat.2023.113684 .,
https://hdl.handle.net/21.15107/rcub_dais_14289 .