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dc.creatorJanačković, Marija
dc.creatorGvozdenović, Milica M.
dc.creatorJugović, Branimir
dc.creatorGrgur, Branimir
dc.date.accessioned2018-07-25T12:08:52Z
dc.date.available2018-07-25T12:08:52Z
dc.date.issued2015
dc.identifier.issn0379-6779
dc.identifier.urihttp://dais.sanu.ac.rs/123456789/3532
dc.description.abstractThe copper sulfide is successfully deposited onto electrochemically formed polypyrrole, by successive ion-adsorption and reaction (SILAR) processes. The photoelectrochemical behavior of the polypyrrole, copper sulfide and copper sulfide modified polypyrrole are investigated in the sulfide based solution, under cathodic and anodic polarization. The improvement of the photooxidation stability, as well as activity of copper sulfide modified polypyrrole is achieved. Such behavior is explained by recombination of electrons from Cu2-xS conducting band with the holes of the PPy LUMO. © 2015 Elsevier B.V. All rights reserved.
dc.publisherElsevier
dc.relationinfo:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/172046/RS//
dc.rightsrestrictedAccess
dc.sourceSynthetic Metals
dc.subjectband gap
dc.subjectoxidation
dc.subjectphotocorrosion
dc.subjectsulfide
dc.subjectthiourea
dc.titleThe improved photooxidation stability of the SILAR deposited copper sulfide on polypyrrole
dc.typearticleen
dc.rights.licenseARR
dcterms.abstractЈаначковић, Марија; Гвозденовић, Милица; Југовић, Бранимир; Гргур, Бранимир;
dc.citation.spage37
dc.citation.epage43
dc.citation.volume203
dc.identifier.wos000353097600006
dc.identifier.doi10.1016/j.synthmet.2015.02.011
dc.identifier.scopus2-s2.0-84923241488
dc.type.versionpublishedVersion


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