The improved photooxidation stability of the SILAR deposited copper sulfide on polypyrrole
Article (Published version)
MetadataShow full item record
The copper sulfide is successfully deposited onto electrochemically formed polypyrrole, by successive ion-adsorption and reaction (SILAR) processes. The photoelectrochemical behavior of the polypyrrole, copper sulfide and copper sulfide modified polypyrrole are investigated in the sulfide based solution, under cathodic and anodic polarization. The improvement of the photooxidation stability, as well as activity of copper sulfide modified polypyrrole is achieved. Such behavior is explained by recombination of electrons from Cu2-xS conducting band with the holes of the PPy LUMO. © 2015 Elsevier B.V. All rights reserved.
Keywords:band gap / oxidation / photocorrosion / sulfide / thiourea
Source:Synthetic Metals, 2015, 203, 37-43